traceCLEAN assures best cleaning quality of your TFM, glass and quartz parts for ICP/ICP-MS accessories. Any trace metal contaminants that are present in the cleaning acid stay within the reservoir and do not come in contact with the cleaned trace accessories.
Cleaning various items used in ultra-trace analysis work is a critically important laboratory routine. To minimize contamination, traditional cleaning methods require soaking items in hot acids, often for several hours. To be effective large volumes of acid are consumed and need to be changes regularly. There is also a substantial risk of exposure to hot acids and acid vapors using traditional soaking techniques. To address these issues, Milestone has developed the traceCLEAN, a fully automated, self-contained, acid steam cleaning system for trace metal analysis accessories.
Best cleaning quality of lab apparatus, either TFM, glass and quartz parts
No operator exposure to acid vapors.
Fast, convenient, clean, and fully automated.
No changing of acids or soaking required.
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Steam cleaning with nitric or hydrochloric acid vapors is a very effective cleaning method for preconditioning and routine cleaning of containers and apparatus. The container to be cleaned is placed over a PTFE coated glass rod. Acid in the lower reservoir is heated, and purified acid vapor travels up through the glass rod and condenses on the container, removing surface contamination.
The container to be cleaned is placed over a PTFE coated glass rod. Acid in the lower reservoir is heated, and purified acid vapor travels up through the glass rod and condenses on the container, removing surface contamination. This method of cleaning is a preferred alternative to the soaking preconditioning methods for the following reasons:
1, The trace metal contamination found in the reagent grade acid remains in the lower reservoir and does not come in contact with the component to be cleaned.
2. The clean component does not remain in contact with the cleaning acid after the surface contamination is removed.
3. The critical surfaces of the clean component are dry when the cleaning process is complete. This eliminates the need for rinsing and air drying.
4. The cleaning process takes place in a sealed container which minimizes airborne contamination and provides a clean environment for the components to be stored until they are needed.
Read our book! It explains how a laboratory can reach full control of analytical blanks and sample preparation for obtaining accurate results. The application of instruments and strategies to control sample prep blank is often called a “Clean Chemistry” technique. This book discusses the factors impacting blank quality, in particular when microwave digestion is used, and reviews some Clean Chemistry products and technologies designed to help the analyst generate superior analytical data on their ICP-OES or ICP-MS instrumentation.
At Kovalent we strive to establish and develop long-term partnerships with our customers. When we use the word “partnership” we mean that Kovalent becomes an integral part of our customers’ projects, where we are expected to fully understand their application needs. We aim to make Kovalent our customers’ first and natural choice, and this ambition permeates our entire organisation from initial contact to finished and delivered product.
Genetec is a member of the same family of companies as Kovalent. Both companies share the same set of values and are in many ways integrated with each other. The main difference between the two companies are their products. Kovalent is involved in system solutions including instrumentation and Genetec is mainly working with consumables. The focus of Genetec is chromatography accessories. You are welcome to visit their state of the art web shop: genetec.se