Acid steam cleaning system
traceCLEAN assures best cleaning quality of your TFM, glass and quartz parts for ICP/ICP-MS accessories. Any trace metal contaminants that are present in the cleaning acid stay within the reservoir and do not come in contact with the cleaned trace accessories.
Full contamination control from containers
Cleaning various items used in ultra-trace analysis work is a critically important laboratory routine. To minimize contamination, traditional cleaning methods require soaking items in hot acids, often for several hours. To be effective large volumes of acid are consumed and need to be changes regularly. There is also a substantial risk of exposure to hot acids and acid vapors using traditional soaking techniques. To address these issues, Milestone has developed the traceCLEAN, a fully automated, self-contained, acid steam cleaning system for trace metal analysis accessories.
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Versatile:
Best cleaning quality of lab apparatus, either TFM, glass and quartz parts
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Safe and Easy-to-use:
No operator exposure to acid vapors.
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Highly Productive:
Fast, convenient, clean, and fully automated.
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Cost-effective and productive:
No changing of acids or soaking required.
Product Specialist
Mikael Alfredsson
031-7098186
How it works
Steam cleaning with nitric or hydrochloric acid vapors is a very effective cleaning method for preconditioning and routine cleaning of containers and apparatus. The container to be cleaned is placed over a PTFE coated glass rod. Acid in the lower reservoir is heated, and purified acid vapor travels up through the glass rod and condenses on the container, removing surface contamination.
Compare acid steam cleaning to acid leaching
The container to be cleaned is placed over a PTFE coated glass rod. Acid in the lower reservoir is heated, and purified acid vapor travels up through the glass rod and condenses on the container, removing surface contamination. This method of cleaning is a preferred alternative to the soaking preconditioning methods for the following reasons:
1, The trace metal contamination found in the reagent grade acid remains in the lower reservoir and does not come in contact with the component to be cleaned.
2. The clean component does not remain in contact with the cleaning acid after the surface contamination is removed.
3. The critical surfaces of the clean component are dry when the cleaning process is complete. This eliminates the need for rinsing and air drying.
4. The cleaning process takes place in a sealed container which minimizes airborne contamination and provides a clean environment for the components to be stored until they are needed.
Do you know how to reduce the sample prep blank?
Read our book! It explains how a laboratory can reach full control of analytical blanks and sample preparation for obtaining accurate results. The application of instruments and strategies to control sample prep blank is often called a “Clean Chemistry” technique. This book discusses the factors impacting blank quality, in particular when microwave digestion is used, and reviews some Clean Chemistry products and technologies designed to help the analyst generate superior analytical data on their ICP-OES or ICP-MS instrumentation.
